Tel Aviv, Israel

Yariz Oz

This inventor holds 1 USPTO granted patent. Top assignee: Adeia Semiconductor Bonding Technologies Inc.. Active years: 2014.


Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 14(Granted Patents)


Company Filing History:


Years Active: 2014

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1 patent (USPTO):Explore Patents

Title: The Innovative Contributions of Yariz Oz

Introduction

Yariz Oz is a notable inventor based in Tel Aviv, Israel. He has made significant contributions to the field of image processing through his innovative patent. His work focuses on enhancing the efficiency of image construction techniques, which has implications in various technological applications.

Latest Patents

Yariz Oz holds a patent for a "Forward interpolation approach for constructing a second version of an image from a first version of the image." This approach enables the construction of a second version of an image by processing pixels from the first version one row at a time. As pixels are processed, they can determine pixel values on different rows of the second version. This method allows for multiple partially filled output line buffers at any given time, leading to significant benefits such as reduced storage requirements and lower internal bandwidth and processing compared to traditional backward interpolation methods.

Career Highlights

Yariz Oz is associated with Adeia Semiconductor Bonding Technologies Inc., where he applies his expertise in image processing. His innovative approach has positioned him as a valuable asset in the field of technology and innovation.

Collaborations

Yariz collaborates with talented individuals such as Noy Cohen and Daniel Cohen, contributing to a dynamic work environment that fosters creativity and innovation.

Conclusion

Yariz Oz's contributions to image processing through his patented forward interpolation approach exemplify the impact of innovative thinking in technology. His work not only enhances image construction techniques but also sets a precedent for future advancements in the field.

Profile summary based on public USPTO records.
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