Shanxi, China

Yaping Fan

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Taiyuan University of Technology. Active years: 2023.

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2023

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1 patent (USPTO):Explore Patents

Title: Yaping Fan: Innovator in Silicon Carbide Photodetectors

Introduction

Yaping Fan is a notable inventor based in Shanxi, China. He has made significant contributions to the field of semiconductor photodetectors. His innovative work focuses on developing advanced technologies that enhance the performance of photodetectors.

Latest Patents

Yaping Fan holds a patent for a "Silicon carbide-based full-spectrum-responsive photodetector and method for producing same." This invention relates to semiconductor photodetectors, specifically a silicon carbide-based UV-visible-NIR full-spectrum-responsive photodetector. The photodetector features a silicon carbide substrate, metal counter electrodes, and a surface plasmon polariton nanostructure. The design allows for efficient collection of free carriers generated by ultraviolet light and hot carriers from visible light, enabling the generation of electrical signals.

Career Highlights

Yaping Fan is affiliated with Taiyuan University of Technology, where he continues to advance research in semiconductor technologies. His work has garnered attention for its potential applications in various fields, including telecommunications and environmental monitoring.

Collaborations

Yaping Fan collaborates with esteemed colleagues, including Yanxia Cui and Guohui Li. Their combined expertise contributes to the innovative research environment at Taiyuan University of Technology.

Conclusion

Yaping Fan's contributions to the field of photodetectors exemplify the importance of innovation in semiconductor technology. His work not only advances scientific understanding but also paves the way for future technological developments.

Profile summary based on public USPTO records.
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