The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 25, 2023

Filed:

Oct. 29, 2021
Applicant:

Taiyuan University of Technology, Shanxi, CN;

Inventors:

Yanxia Cui, Shanxi, CN;

Yaping Fan, Shanxi, CN;

Xianyong Yan, Shanxi, CN;

Guohui Li, Shanxi, CN;

Yuan Tian, Shanxi, CN;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 31/101 (2006.01); H01L 31/0224 (2006.01); H01L 31/108 (2006.01); H01L 31/028 (2006.01);
U.S. Cl.
CPC ...
H01L 31/1013 (2013.01); H01L 31/022408 (2013.01); H01L 31/1085 (2013.01); H01L 31/028 (2013.01);
Abstract

The present application relates to semiconductor photodetectors, in particular to a silicon carbide-based UV-visible-NIR full-spectrum-responsive photodetector and a method for fabricating the same. The photodetector includes a silicon carbide substrate, and metal counter electrodes and a surface plasmon polariton nanostructure arranged thereon. The silicon carbide substrate and the metal counter electrodes constitute a metal-semiconductor-metal photodetector with coplanar electrodes. When the ultraviolet light is input, free carriers directly generated in silicon carbide are collected by an external circuit to generate electrical signals. When the visible light is input, hot carriers generated in the surface plasmon polariton nanostructure tunnel into the silicon carbide semiconductor to become free carriers to generate electrical signals.


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