This inventor holds 1 USPTO granted patent. Top assignees: Chongqing Institute of East China Normal University, East China Normal University, University of Shanghai for Science and Technology. Active years: 2023.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:

Years Active: 2023
Title: Yanying Ma: Innovator in Stealth Dicing Technology
Introduction
Yanying Ma is a notable inventor based in Chongqing, China. He has made significant contributions to the field of material processing, particularly through his innovative patent related to stealth dicing methods. His work has implications for various industries, including electronics and materials science.
Latest Patents
Yanying Ma holds a patent for a "Stealth dicing method including filamentation and apparatus thereof." This patent describes a method where a focusing element directs a laser beam onto the surface of the material to be diced. The process involves creating a dynamic-equilibrium plasma channel within the material, achieved through the self-focusing and defocusing effects of plasma generated by ionizing the material. This technique allows for the formation of a modified layer throughout the plasma channel, enabling stealth dicing.
Career Highlights
Throughout his career, Yanying Ma has worked at prestigious institutions, including the Chongqing Institute of East China Normal University and East China Normal University. His research and development efforts have focused on advancing techniques in material processing, contributing to the efficiency and effectiveness of dicing methods.
Collaborations
Yanying Ma has collaborated with notable colleagues, including Heping Zeng and Shuai Yuan. These partnerships have fostered innovation and have been instrumental in the development of his patented technologies.
Conclusion
Yanying Ma's contributions to stealth dicing technology exemplify the impact of innovative thinking in material processing. His work continues to influence advancements in the field, showcasing the importance of research and collaboration in driving technological progress.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile