Rochester, NY, United States of America

Yanjia Zuo


Average Co-Inventor Count = 5.1

ph-index = 3

Forward Citations = 40(Granted Patents)


Location History:

  • Webster, NY (US) (2014 - 2018)
  • Rochester, NY (US) (2015 - 2020)

Company Filing History:


Years Active: 2014-2020

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25 patents (USPTO):

Title: Yanjia Zuo: Innovating Printhead Technology

Introduction

Yanjia Zuo, based in Rochester, NY, is a prominent inventor with a robust portfolio consisting of 25 patents. His innovative work mainly focuses on advancements in printhead technology, where his expertise has significantly contributed to the field.

Latest Patents

Among his latest inventions is a sophisticated printhead assembly that utilizes two adhesives. This assembly is designed with a first plate and a second plate stacked together. A first adhesive bonds the plates, while a second adhesive surrounds the outer edge of the first adhesive, possessing a lower oxygen migration rate than the first. This innovative design holds an oxygen-sensitive component within the outer edge of the first adhesive, enhancing the performance and reliability of the printhead.

Career Highlights

Yanjia Zuo has made significant strides in his career by working with renowned institutions such as Xerox Corporation and the Massachusetts Institute of Technology (MIT). His experiences in these organizations have allowed him to hone his skills and drive forward innovative solutions in print technology.

Collaborations

Throughout his career, Zuo has collaborated with notable colleagues, including Santokh Singh Badesha and Mandakini Kanungo. These partnerships have facilitated the sharing of ideas and expertise, fostering a collaborative environment that is essential for innovation.

Conclusion

With a strong patent portfolio and a firm foundation in cutting-edge technology, Yanjia Zuo continues to be a driving force in the realm of printhead development. His innovative approaches not only enhance product functionality but also pave the way for future advancements in the field.

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