Yaniv Weiss

Title: Yaniv Weiss: Innovator in Overlay Metrology

Introduction

Yaniv Weiss is a notable inventor based in Milpitas, California. He has made significant contributions to the field of overlay metrology, which is crucial for precision in semiconductor manufacturing. His innovative work has led to the development of a unique patent that enhances measurement accuracy.

Latest Patents

Yaniv Weiss holds a patent titled "System and method for overlay metrology using a phase mask." This patent describes an overlay metrology system that includes a controller with one or more processors. The processors are designed to execute program instructions that allow them to receive pupil images of collected light from an overlay target. They also receive a known phase distribution to be introduced to an illumination beam directed at the overlay target. The processors model an intensity function that relates the pupil images, the known phase distribution, and one or more decentered shift parameters of the overlay target's structures. By fitting the pupil images to the intensity function, the processors generate an overlay measurement based on the fit.

Career Highlights

Yaniv Weiss is currently employed at Kla Corporation, a company known for its advanced metrology and inspection solutions in the semiconductor industry. His work at Kla Corporation has positioned him as a key player in the development of innovative technologies that improve manufacturing processes.

Collaborations

Throughout his career, Yaniv has collaborated with talented individuals such as Iftach Galon and Itay Gdor. These collaborations have fostered an environment of innovation and have contributed to the advancement of overlay metrology technologies.

Conclusion

Yaniv Weiss is a distinguished inventor whose work in overlay metrology has made a significant impact on the semiconductor industry. His patent and contributions to Kla Corporation highlight his commitment to innovation and excellence in technology.