Eindhoven, Netherlands

Yanin Kasemsinsup

This inventor holds 1 USPTO granted patent. Top assignee: Asml Netherlands B.v.. Active years: 2018.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yanin Kasemsinsup. Retrieved from https://idiyas.com/inventor/yanin-kasemsinsup

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2018

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1 patent (USPTO):Explore Patents

Title: Yanin Kasemsinsup: Pioneering Innovation in Object Positioning Technology

Introduction: Yanin Kasemsinsup, a dedicated inventor based in Eindhoven, NL, has made significant contributions to the field of lithography with his groundbreaking work in object positioning systems.

Latest Patents: With a total of 1 patent to his name, Yanin's most notable invention is the Object Positioning in Lithography system. This system integrates precise measurement, dynamic modeling, and control systems to enhance the accuracy of object positioning in lithographic processes.

Career Highlights: Yanin Kasemsinsup is a valued member of ASML Netherlands B.V., a leading innovator in semiconductor technology. His expertise and innovative solutions have played a pivotal role in advancing lithography technologies and pushing the boundaries of precision engineering.

Collaborations: Within the dynamic work environment at ASML, Yanin collaborates closely with industry experts such as Hans Butler and Ramidin Izair Kamidi. Together, they form a multidisciplinary team that drives innovation and fosters creative problem-solving approaches.

Conclusion: Yanin Kasemsinsup's passion for innovation and his relentless pursuit of excellence continue to inspire both his colleagues at ASML and the broader community of inventors. His pioneering work in object positioning technology is shaping the future of technology and setting new standards for precision engineering in lithography.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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