Yongin, South Korea

Yangryeong Kim

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignees: Enf Technology Co., Ltd., Samsung Display Co., Ltd.. Active years: 2025.

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 10.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Innovations of Yangryeong Kim in Etchant Composition

Introduction

Yangryeong Kim is a notable inventor based in Yongin-si, South Korea. He has made significant contributions to the field of materials science, particularly in the development of etchant compositions. His work focuses on enhancing the etching process for indium oxide films and silver-containing metal layers.

Latest Patents

Yangryeong Kim holds 1 patent for his invention titled "Etchant composition for indium oxide film or silver-containing metal film and method for preparing the same." This etchant composition is designed to provide selective etching of indium oxide films or silver-containing metal layers. The formulation includes nitric acid, an organic acid, a sulfur compound, and a tin compound. Notably, the organic acid does not contain sulfur or tin, and the sulfur compound is free from tin. This innovative composition minimizes damage to the underlying metal film while exhibiting excellent etching characteristics, including etching rate, bias, residue, precipitation, and uniformity.

Career Highlights

Throughout his career, Yangryeong Kim has worked with prominent companies in the technology sector. He has been associated with Samsung Display Co., Ltd. and Enf Technology Co., Ltd., where he has contributed to advancements in display technologies and materials.

Collaborations

Yangryeong Kim has collaborated with several professionals in his field, including Hyoungsik Kim and Jonghee Park. These collaborations have further enriched his research and development efforts.

Conclusion

Yangryeong Kim's innovative work in etchant compositions demonstrates his commitment to advancing materials science. His contributions are significant in improving the etching processes used in various applications.

Profile summary based on public USPTO records.
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