The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 03, 2025
Filed:
Nov. 25, 2022
Samsung Display Co., Ltd., Yongin-Si, KR;
Enf Technology Co., Ltd., Yongin-si, KR;
Hyoungsik Kim, Yongin-si, KR;
Jonghee Park, Yongin-si, KR;
Sehoon Kim, Yongin-si, KR;
Boyeon Lee, Yongin-si, KR;
Yangryeong Kim, Yongin-si, KR;
Seokil Jung, Yongin-si, KR;
Ikjoon Kim, Yongin-si, KR;
Sangseung Park, Yongin-si, KR;
Wonho Noh, Yongin-si, KR;
Mingyeong Jeong, Yongin-si, KR;
Samsung Display Co., Ltd., Yongin-si, KR;
ENF TECHNOLOGY CO., LTD., Yongin-si, KR;
Abstract
An etchant composition is disclosed that provides selective etching of an indium oxide film or a sliver-containing metal layer. The etchant composition includes nitric acid, an organic acid, a sulfur compound, and a tin compound. The organic acid does not include the elements of sulfur and tin. The sulfur compound does not include the element of tin. The etchant composition may minimize the damage of a lower metal film and may exhibit excellent etching characteristics in terms of etching rate, bias, residue, precipitation, and etching uniformity.