Shanghai, China

Yanchun Ma

This inventor holds 2 USPTO granted patents. Top assignees: Semiconductor Manufacturing International (Beijing) Corporation, Semiconductor Manufacturing International (Shanghai) Corporation. Active years: 2015.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yanchun Ma. Retrieved from https://idiyas.com/inventor/yanchun-ma

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 2

Forward Citations = 8(Granted Patents)


Company Filing History:


Years Active: 2015

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2 patents (USPTO):Explore Patents

Title: Yanchun Ma: Innovator in CMOS Imaging Sensors

Introduction

Yanchun Ma is a prominent inventor based in Shanghai, China. He has made significant contributions to the field of semiconductor technology, particularly in the development of pixel structures for CMOS imaging sensors. With a total of 2 patents, his work has advanced the capabilities of imaging technology.

Latest Patents

Yanchun Ma's latest patents focus on innovative methods for fabricating pixel structures of CMOS transistors. One of the methods involves providing a semiconductor substrate doped with first type doping ions and forming a trench in the substrate through etching. The process includes creating isolation layers on the trench's side surfaces to prevent dark current from laterally transferring. Additionally, an epitaxial layer doped with second type doping ions, which have an opposite doping type to the first, is formed within the trench. The method further includes forming a pinning layer on the epitaxial layer's top surface and establishing a gate structure on the semiconductor substrate adjacent to the epitaxial layer. Finally, a floating diffusion region is created in the substrate, positioned away from the epitaxial layer.

Career Highlights

Yanchun Ma has worked with notable companies in the semiconductor industry, including Semiconductor Manufacturing International Corporation in both Beijing and Shanghai. His experience in these organizations has allowed him to refine his skills and contribute to cutting-edge technology in imaging sensors.

Collaborations

Throughout his career, Yanchun Ma has collaborated with talented individuals such as Yan Wei and Hualong Song. These partnerships have fostered innovation and have been instrumental in the development of his patented technologies.

Conclusion

Yanchun Ma's contributions to the field of CMOS imaging sensors exemplify his dedication to innovation and technology advancement. His patents reflect a deep understanding of semiconductor fabrication processes, positioning him as a key figure in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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