Yan Tang

Title: Yan Tang - Innovator in Illumination Compensation Methods

Introduction

Yan Tang is a notable inventor based in Sichuan, China. He has made significant contributions to the field of imaging systems, particularly through his innovative methods for illumination compensation. His work is essential for enhancing the accuracy and efficiency of exposure imaging systems.

Latest Patents

Yan Tang holds a patent for an illumination compensation method. This method involves acquiring working gaps between an imaging film stack and a mask in an exposure imaging system. It includes calculating imaging light field intensities of a photoresist layer corresponding to different working gaps. Furthermore, it constructs a functional dependence of the imaged pattern critical dimension in the photoresist layer on the working gap based on the imaging light field intensity critical dimension. The method also calculates compensation parameters required for illumination light according to this functional dependence and performs illumination compensation on the exposure imaging system based on these parameters. This patent showcases his expertise and innovative approach to solving complex problems in imaging technology.

Career Highlights

Yan Tang is affiliated with the Chinese Academy of Sciences, where he continues to advance research in his field. His work has garnered attention for its practical applications and contributions to the scientific community.

Collaborations

He has collaborated with notable colleagues, including Xiangang Luo and Yanqin Wang, who share his commitment to innovation and research excellence.

Conclusion

Yan Tang's contributions to illumination compensation methods highlight his role as a leading inventor in the field of imaging systems. His innovative approaches continue to influence advancements in technology and research.