The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 10, 2026
Filed:
Jun. 27, 2025
The Institute of Optics and Electronics, the Chinese Academy of Sciences, Sichuan, CN;
Xiangang Luo, Sichuan, CN;
Yanqin Wang, Sichuan, CN;
Weijie Kong, Sichuan, CN;
Changtao Wang, Sichuan, CN;
Ge Yin, Sichuan, CN;
Yan Tang, Sichuan, CN;
Yu He, Sichuan, CN;
Chengwei Zhao, Sichuan, CN;
Zeyu Zhao, Sichuan, CN;
Abstract
An illumination compensation method, comprising: acquiring working gaps between an imaging film stack and a mask in an exposure imaging system; calculating imaging light field intensities of a photoresist layer in the imaging film stack corresponding to the different working gaps, and, constructing a functional dependence of imaged pattern critical dimension in the photoresist layer of the imaging film stack on the working gap based on said imaging light field intensity critical dimension; calculating compensation parameters required for illumination light according to the said functional dependence of imaged pattern critical dimension on working gap; and, performing illumination compensation on the exposure imaging system according to the compensation parameters.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile