Weijie Kong

Title: Weijie Kong: Innovator in Optical Lithography

Introduction

Weijie Kong is a prominent inventor based in Sichuan, China. He has made significant contributions to the field of optical lithography, holding two patents that showcase his innovative approaches to this technology. His work is instrumental in advancing the capabilities of lithography methods used in various applications.

Latest Patents

Weijie Kong's latest patents include a "Method for inverse optical proximity correction of super-resolution lithography based on level set algorithm." This patent outlines a process that involves obtaining first mask data according to a target pattern and constructing a level set function. The method includes performing forward simulation to obtain an electric field distribution on a photoresist and calculating an imaging error between the photoresist pattern and the target pattern. The iterative calculations lead to the evolution of the level set function until mask data meeting a preset condition is achieved.

Another notable patent is the "Secondary imaging optical lithography method and apparatus." This patent describes a method that involves closely contacting a lithography mask plate with a flexible transparent transfer substrate. The process includes irradiating the photosensitive layer through the lithography mask plate and transferring a pattern to a device substrate coated with photoresist. The developed device substrate results in a device pattern that conforms to the original lithography mask plate.

Career Highlights

Weijie Kong is affiliated with the Chinese Academy of Sciences, where he conducts research and development in optical lithography. His work has been pivotal in enhancing the precision and efficiency of lithographic techniques, which are crucial in the manufacturing of microelectronics and other advanced technologies.

Collaborations

Weijie Kong collaborates with esteemed colleagues such as Xiangang Luo and Changtao Wang. Their combined expertise contributes to the innovative research and development efforts at the Chinese Academy of Sciences.

Conclusion

Weijie Kong's contributions to optical lithography through his patents and research at the Chinese Academy of Sciences highlight his role as a leading inventor in this field. His innovative methods continue to influence advancements in technology and manufacturing processes.