Fremont, CA, United States of America

Yan Rubin

This inventor holds 1 USPTO granted patent. Top assignee: Novellus Systems Incorporated. Active years: 2006.


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 80(Granted Patents)


Company Filing History:


Years Active: 2006

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1 patent (USPTO):Explore Patents

Title: Yan Rubin: Innovator in Plasma Processing Technology

Introduction

Yan Rubin is a notable inventor based in Fremont, CA (US). She has made significant contributions to the field of plasma processing technology. Her innovative work has led to the development of a patent that enhances the efficiency of radio frequency (RF) power delivery systems.

Latest Patents

Yan Rubin holds a patent for an RF delivery configuration in a plasma processing system. This invention includes an automatic impedance matching network that receives RF power from an RF generator. Additionally, it features a fixed impedance matching network that is coupled between the automatic impedance matching network and the plasma processing chamber. The fixed impedance matching network is designed to transform a first impedance presented by the chamber to a second impedance, allowing the automatic impedance matching network to operate within a tuning range. This advancement is crucial for improving the performance of plasma processing systems.

Career Highlights

Yan Rubin is currently employed at Novellus Systems Incorporated, a company known for its innovative solutions in semiconductor manufacturing. Her work at Novellus has positioned her as a key player in the development of advanced plasma processing technologies.

Collaborations

Some of her notable coworkers include Stephen E Hilliker and George Thomas. Their collaborative efforts contribute to the ongoing advancements in the field of plasma processing.

Conclusion

Yan Rubin's contributions to plasma processing technology through her innovative patent demonstrate her expertise and commitment to advancing the industry. Her work continues to influence the development of efficient RF power delivery systems.

Profile summary based on public USPTO records.
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