Yan Ma

Title: Yan Ma and Ion Implantation Dose Compensation.

Introduction

Yan Ma is an inventor based in Acton, Massachusetts, and is associated with Applied Materials, Inc. His patent work addresses exposure control in ion implantation systems, where precise substrate positioning supports accurate processing.

Latest Patents

The provided information lists one patent for Yan Ma: Multimode Dose Compensation System. The invention describes a method, system, and computer program product for controlling the exposure of a substrate on a platen to an ion beam. It receives current values associated with the ion source’s powering potential and the apparatus’s accelerating or decelerating potential. It also determines energy-filter supply current values from the potentials supplied to an energy filter in the beam path. Using these values, the system generates platen position values and adjusts the platen’s position. Ma is credited with 1 patent in the information provided.

Career Highlights

Ma’s listed invention focuses on coordinating electrical measurements with platen movement in an ion implantation apparatus. This approach is designed to support dose compensation by adjusting substrate position based on operating conditions that affect ion-beam generation and filtering. The provided information associates Ma with Applied Materials, Inc., a company active in materials engineering and semiconductor manufacturing equipment.

Collaborations

The supplied information identifies Klaus Petry and Jacob William Mullin as Ma’s coworkers. It does not specify their roles in the patent or describe particular collaborative contributions.

Conclusion

Yan Ma’s listed patent concerns a system for using ion-source, acceleration or deceleration, and energy-filter measurements to guide platen positioning during ion implantation. It reflects an engineering focus on exposure control in semiconductor processing.