The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 13, 2026
Filed:
Dec. 27, 2023
Applied Materials, Inc., Santa Clara, CA (US);
Klaus Petry, Merrimac, MA (US);
Jacob William Mullin, North Andover, MA (US);
Yan MA, Acton, MA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A method, a system and computer program product for controlling exposure of a substrate positioned on a platen in an ion implantation system to an ion beam. A first current value determined based on a powering potential powering an ion source is received. A second current value determined based on an accelerating potential or a decelerating potential supplied to the ion implantation apparatus and affecting generation of the ion beam by the ion source for application to a substrate positioned on a platen is received. One or more energy filter supply current values are determined based on one or more energy filter supply potentials supplied to an energy filter positioned in the path of the ion beam. Platen position values are generated based on the first and second current values and energy filter supply current values. A position of the platen is adjusted using platen position values.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile