Yan Feng

Title: Yan Feng - Innovator in X-ray Diffractive Structures

Introduction

Yan Feng is a notable inventor based in Pleasanton, CA (US). She has made significant contributions to the field of nanotechnology, particularly in the stabilization of planar nanostructures used in X-ray applications. Her innovative approach addresses critical challenges in the stability of high aspect-ratio structures.

Latest Patents

Yan Feng holds a patent for "High aspect-ratio X-ray diffractive structure stabilization methods and systems." This patent describes a method to stabilize planar nanostructures, such as grating and zone plate lenses, which are essential for directing or focusing X-ray radiation. The method involves the deposition of a top stabilizing layer that enhances the structural integrity of these devices. By applying a metallic coating, such as titanium, the nanostructures are constrained at the top, effectively eliminating electrostatic forces and reducing thermal gradients that may affect performance.

Career Highlights

Yan Feng is currently employed at Xradia, Inc., where she continues to advance her research and development efforts. Her work has been instrumental in improving the reliability and efficiency of X-ray imaging technologies. With her expertise, she has contributed to the evolution of nanostructure applications in various scientific fields.

Collaborations

Throughout her career, Yan has collaborated with esteemed colleagues, including Wenbing Yun and Alan Francis Lyon. These partnerships have fostered a dynamic research environment, leading to innovative solutions in the field of X-ray technology.

Conclusion

Yan Feng's contributions to the stabilization of X-ray diffractive structures highlight her role as a leading inventor in nanotechnology. Her innovative methods and collaborative efforts continue to push the boundaries of scientific research and application.