Urawa, Japan

Yamagata Toshio

This inventor holds 1 USPTO granted patent. Top assignee: Kimoto Co, Ltd.. Active years: 1986.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yamagata Toshio. Retrieved from https://idiyas.com/inventor/yamagata-toshio

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 5(Granted Patents)


Company Filing History:


Years Active: 1986

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1 patent (USPTO):Explore Patents

Title: Yamagata Toshio: Innovator in Photosensitive Masking Technology

Introduction

Yamagata Toshio is a notable inventor based in Urawa, Japan. He has made significant contributions to the field of photosensitive masking technology, particularly in the area of plate making. His innovative approach has led to advancements that enhance efficiency in the manufacturing process.

Latest Patents

Yamagata Toshio holds a patent for a process related to the preparation of a masking element for forming multicolor images. The patent describes a photosensitive masking element that includes a support made of a transparent film, a metal thin film layer formed on the support, and a photosensitive masking layer that adheres strongly to the metal thin film layer. This invention eliminates the need for filling and retouching ditches with correction liquid, thereby significantly improving the efficiency of plate making.

Career Highlights

Yamagata Toshio is associated with Kimoto Co., Ltd., where he has been instrumental in developing innovative solutions in his field. His work has not only contributed to the company's success but has also set new standards in the industry.

Collaborations

Yamagata has collaborated with notable colleagues such as Ogura Masako and Takeo Moriya. These partnerships have fostered a creative environment that encourages innovation and the sharing of ideas.

Conclusion

Yamagata Toshio's contributions to photosensitive masking technology exemplify the impact of innovation in manufacturing processes. His patent and collaborative efforts continue to influence the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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