The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 08, 1986
Filed:
Aug. 21, 1984
Applicant:
Inventors:
Assignee:
Kimoto & Co., Ltd., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F / ; G03F / ;
U.S. Cl.
CPC ...
430-5 ; 430143 ; 430145 ; 430158 ; 430160 ; 430166 ; 430252 ; 430253 ; 430258 ; 430293 ; 430294 ; 430301 ; 430325 ; 430326 ;
Abstract
The present invention relates to a photosensitive masking element for plate making including a support made of a transparent film; a metal thin film layer formed on the support; and a photosensitive masking layer formed on said metal thin film layer and strongly adhering thereto. In preparing masks for various colors, the photosensitive masking material of the present invention makes it unnecessary to fill and retouch ditches corresponding to unnecessary enclosing lines with a correction liquid, resulting in a marked improvement in the efficiency of plate making.