This inventor holds 1 USPTO granted patent. Top assignee: Kimoto Co, Ltd.. Active years: 1986.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 1986
Title: Ogura Masako: Innovator in Photosensitive Masking Technology
Introduction
Ogura Masako is a prominent inventor based in Kawaguchi, Japan. She has made significant contributions to the field of photosensitive materials, particularly in the preparation of masking elements for multicolor plate making. Her innovative approach has improved efficiency in the production process.
Latest Patents
Ogura holds a patent for a "Process for preparation of a masking element for forming a multicolor." This invention relates to a photosensitive masking element that includes a support made of a transparent film, a metal thin film layer formed on the support, and a photosensitive masking layer that adheres strongly to the metal thin film layer. This technology eliminates the need for filling and retouching ditches with correction liquid, thereby enhancing the efficiency of plate making.
Career Highlights
Ogura is associated with Kimoto Co., Ltd., where she has been instrumental in advancing the company's technological capabilities. Her work has garnered attention for its practical applications in the printing industry.
Collaborations
Ogura has collaborated with notable colleagues, including Yamagata Toshio and Takeo Moriya. Their combined expertise has contributed to the development of innovative solutions in their field.
Conclusion
Ogura Masako's contributions to the field of photosensitive masking technology exemplify her dedication to innovation. Her patent and collaborative efforts continue to influence the industry positively.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile