Ya-Ping Tseng

Title: The Innovations of Ya-Ping Tseng

Introduction

Ya-Ping Tseng is a notable inventor based in Dasi, Taiwan. He has made significant contributions to the field of semiconductor manufacturing, particularly through his innovative methods for mask exposure. With a total of 2 patents, Tseng continues to push the boundaries of technology in his industry.

Latest Patents

One of Tseng's latest patents is titled "Method and system for exposure of a phase shift mask." This patent outlines a comprehensive method for creating a mask, which includes several steps. The process begins with providing a substrate that has a first attenuating layer and a first imaging layer. It involves performing a first exposure to the imaging layer using radiation energy, followed by etching processes to refine the mask. The method also includes forming a second imaging layer and conducting a second exposure using light energy and another mask, culminating in a third etching step.

Career Highlights

Ya-Ping Tseng is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work has been instrumental in advancing the techniques used in mask production, which are critical for the fabrication of integrated circuits.

Collaborations

Tseng has collaborated with several talented individuals in his field, including Chih-Ming Chen and Ming-Tao Ho. These collaborations have fostered an environment of innovation and creativity, contributing to the success of their projects.

Conclusion

Ya-Ping Tseng's contributions to semiconductor technology through his patents and work at Taiwan Semiconductor Manufacturing Company Limited highlight his role as a key innovator in the industry. His methods for mask exposure are paving the way for advancements in semiconductor manufacturing.