Ya-Jing Yang

Title: The Innovative Contributions of Ya-Jing Yang

Introduction

Ya-Jing Yang is a prominent inventor based in Tainan, Taiwan. He has made significant contributions to the field of technology, particularly in the development of advanced measurement processes and sensor devices. With a total of 9 patents to his name, Yang continues to push the boundaries of innovation.

Latest Patents

One of Yang's latest patents is titled "Process and structure of overlay offset measurement." This patent outlines a comprehensive process that includes providing a substrate, forming a first pattern layer with a predetermined first pattern, and creating a series of photoresist layers. The process culminates in performing overlay offset measurement based on the second pattern layer and a trench that is aligned with the first pattern layer. Another notable patent is the "Method of fabricating a sensor device." This invention describes a sensor device that consists of a sensor substrate, a first transparent layer with an alignment structure, a collimator layer, and a lens, all designed to enhance the functionality of the sensor.

Career Highlights

Ya-Jing Yang is currently employed at Himax Technologies, Inc., where he applies his expertise in developing cutting-edge technologies. His work has been instrumental in advancing the capabilities of measurement and sensor technologies, making significant impacts in various applications.

Collaborations

Yang collaborates with talented individuals in his field, including coworkers Yu-Jui Hsieh and Po-Nan Chen. These collaborations foster an environment of innovation and creativity, allowing for the exchange of ideas and expertise.

Conclusion

Ya-Jing Yang's contributions to technology through his patents and collaborative efforts highlight his role as a leading inventor in the industry. His work continues to inspire advancements in measurement processes and sensor devices, showcasing the importance of innovation in today's technological landscape.