Company Filing History:
Years Active: 2012-2013
Title: The Innovations of Xumou Xu
Introduction
Xumou Xu is a notable inventor based in Campbell, California, recognized for his contributions to the field of integrated circuit fabrication. With a total of two patents to his name, Xu has made significant advancements in lithographic processes that enhance the performance of semiconductor devices.
Latest Patents
Xu's latest patents focus on improving line edge roughness and critical dimensions in lithographic processes. One of his patents, titled "Line edge roughness reduction and double patterning," addresses the challenges of line edge roughness (LER) and critical dimensions (CD) in integrated circuits. This invention utilizes a combination of polarized light lithography, shrink coating processes, and double exposure techniques to achieve better resolution and reduced dimensions in trench structures. Another patent, "Double exposure patterning with carbonaceous hardmask," outlines methods for patterning features in a substrate layer by exposing a photoresist layer multiple times. This innovative approach allows for the reduction of half pitch in features printed with advanced lithography equipment.
Career Highlights
Xumou Xu is currently employed at Applied Materials, Inc., a leading company in the semiconductor industry. His work focuses on developing cutting-edge technologies that improve the efficiency and effectiveness of semiconductor manufacturing processes. Xu's expertise in lithography has positioned him as a key player in the advancement of integrated circuit technology.
Collaborations
Throughout his career, Xu has collaborated with esteemed colleagues, including Huixiong Dai and Christopher S Ngai. These collaborations have fostered an environment of innovation and have contributed to the successful development of new technologies in the semiconductor field.
Conclusion
Xumou Xu's contributions to the field of integrated circuit fabrication through his innovative patents and collaborations highlight his significant role in advancing semiconductor technology. His work continues to influence the industry and pave the way for future innovations.