This inventor holds 1 USPTO granted patent. Top assignee: Chinese Academy of Sciences. Active years: 2015.
Company Filing History:
Years Active: 2015
Title: Xuliang Zhou: Innovator in Semiconductor Technology
Introduction
Xuliang Zhou is a prominent inventor based in Beijing, China. He has made significant contributions to the field of semiconductor technology, particularly in the development of advanced CMOS processes. His innovative work has led to the filing of a patent that showcases his expertise and creativity in this area.
Latest Patents
Xuliang Zhou holds a patent titled "Method of manufacturing Si-based high-mobility group III-V/Ge channel CMOS." This patent describes a comprehensive method that includes several key steps. The process begins with growing a Ge layer on a Si substrate. Following this, a low-temperature nucleation GaAs layer, a high-temperature GaAs layer, a semi-insulating InGaP layer, and a GaAs cap layer are sequentially grown on the Ge layer after a first annealing, forming a sample. The GaAs cap layer is then polished, and an nMOSFET structure is grown after a second annealing on the sample. Selective ICP etching is performed on the surface of the nMOSFET structure to form a groove, followed by the growth of a SiO layer in the groove and on the surface of the nMOSFET structure using PECVD. The ICP etching is repeated to etch the SiO layer down to the Ge layer, forming a trench. The sample is cleaned, and a Ge nucleation layer and a Ge top layer are grown in the trench by UHVCVD. Finally, the Ge top layer is polished, and a part of the SiO layer on the nMOSFET structure is removed, culminating in the performance of a CMOS process.
Career Highlights
Xuliang Zhou is affiliated with the Chinese Academy of Sciences, where he continues to push the boundaries of semiconductor research. His work has not only advanced the field but has also positioned him as a key figure in innovation within the industry.
Collaborations
Xuliang Zhou has collaborated with notable colleagues such as Wei Wang and Jiaoqing Pan. Their combined efforts contribute to the ongoing advancements in semiconductor technology.
Conclusion
Xuliang Zhou's innovative approach to semiconductor manufacturing exemplifies the spirit of invention and research. His contributions, particularly through his patent, highlight the importance of continuous development in technology. His work at the Chinese Academy of Sciences is a testament to his dedication