Company Filing History:
Years Active: 2025
Title: Xueru Yu: Innovator in Critical Dimension Error Analysis
Introduction
Xueru Yu is a prominent inventor based in Shanghai, China. He has made significant contributions to the field of lithography through his innovative methods. His work focuses on improving the accuracy of critical dimension measurements, which are essential in semiconductor manufacturing.
Latest Patents
Xueru Yu holds a patent for a critical dimension error analysis method. This invention involves a systematic approach to measuring and analyzing critical dimension (CD) values during lithography processes. The method includes steps for removing extreme outliers, rebuilding CD values using a reconstruction model, and modifying machine parameters based on calculated results. This innovative approach allows for quick and accurate analysis of critical dimension errors, enhancing the efficiency of lithography processes.
Career Highlights
Xueru Yu is associated with Shanghai IC R&D Center Co., Ltd., where he applies his expertise in semiconductor technology. His work has been instrumental in advancing the methodologies used in the industry. With a focus on precision and accuracy, he continues to contribute to the development of innovative solutions in lithography.
Collaborations
Xueru Yu collaborates with talented colleagues, including Hongxia Sun and Chen Li. Together, they work on various projects aimed at enhancing semiconductor manufacturing processes.
Conclusion
Xueru Yu's contributions to critical dimension error analysis represent a significant advancement in the field of lithography. His innovative methods and collaborative efforts continue to drive progress in semiconductor technology.