This inventor holds 2 USPTO granted patents. Top assignee: Kla Corporation. Active years: 2022-2024.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2022-2024
Title: Xuemei Chen: Innovator in Extreme Ultraviolet Lithography
Introduction
Xuemei Chen is a notable inventor based in Austin, TX (US). She has made significant contributions to the field of extreme ultraviolet lithography, particularly in focus control systems. With a total of 2 patents, her work is recognized for its innovative approach to improving fabrication processes.
Latest Patents
Xuemei Chen's latest patents include a system and method for focus control in extreme ultraviolet lithography systems using a focus-sensitive metrology target. This invention involves the formation and read-out of a focus-sensitive metrology target by a fabrication tool. The resulting overlay signal can be translated into a focus offset by comparing it to a previously determined calibration curve. One or more translated signals may be fed back to the fabrication tool for focus correction or used for predicting on-device overlay. In one embodiment, both focus and overlay can be measured using a single target, which includes a focus-sensitive design on one layer and a relatively less focus-sensitive design on another layer. This innovative approach allows for the estimation of the impact of focus error on device overlay and the calculation of non-zero offset contributions.
Career Highlights
Xuemei Chen is currently employed at Kla Corporation, where she continues to advance her research and development efforts in lithography technologies. Her work has been instrumental in enhancing the precision and efficiency of fabrication tools used in the semiconductor industry.
Collaborations
Xuemei collaborates with Roel Gronheid, who is also a key figure in the field. Their combined expertise contributes to the ongoing advancements in lithography systems.
Conclusion
Xuemei Chen's innovative work in extreme ultraviolet lithography exemplifies the impact of focused research and collaboration in technology development. Her contributions are paving the way for more precise and efficient fabrication processes in the semiconductor industry.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
