Austin, TX, United States of America

Xuemei Chen

This inventor holds 2 USPTO granted patents. Top assignee: Kla Corporation. Active years: 2022-2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Xuemei Chen. Retrieved from https://idiyas.com/inventor/xuemei-chen-0qqxs0vy

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2022-2024

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2 patents (USPTO):Explore Patents

Title: Xuemei Chen: Innovator in Extreme Ultraviolet Lithography

Introduction

Xuemei Chen is a notable inventor based in Austin, TX (US). She has made significant contributions to the field of extreme ultraviolet lithography, particularly in focus control systems. With a total of 2 patents, her work is recognized for its innovative approach to improving fabrication processes.

Latest Patents

Xuemei Chen's latest patents include a system and method for focus control in extreme ultraviolet lithography systems using a focus-sensitive metrology target. This invention involves the formation and read-out of a focus-sensitive metrology target by a fabrication tool. The resulting overlay signal can be translated into a focus offset by comparing it to a previously determined calibration curve. One or more translated signals may be fed back to the fabrication tool for focus correction or used for predicting on-device overlay. In one embodiment, both focus and overlay can be measured using a single target, which includes a focus-sensitive design on one layer and a relatively less focus-sensitive design on another layer. This innovative approach allows for the estimation of the impact of focus error on device overlay and the calculation of non-zero offset contributions.

Career Highlights

Xuemei Chen is currently employed at Kla Corporation, where she continues to advance her research and development efforts in lithography technologies. Her work has been instrumental in enhancing the precision and efficiency of fabrication tools used in the semiconductor industry.

Collaborations

Xuemei collaborates with Roel Gronheid, who is also a key figure in the field. Their combined expertise contributes to the ongoing advancements in lithography systems.

Conclusion

Xuemei Chen's innovative work in extreme ultraviolet lithography exemplifies the impact of focused research and collaboration in technology development. Her contributions are paving the way for more precise and efficient fabrication processes in the semiconductor industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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