Xueliang Wang

Title: Xueliang Wang: Innovator in Cable Topology and IGBT Technology

Introduction

Xueliang Wang is a prominent inventor based in Shanghai, China. He has made significant contributions to the fields of cable topology and insulated gate bipolar transistors (IGBT). With a total of 5 patents, his work has garnered attention for its innovative approaches and practical applications.

Latest Patents

One of Xueliang Wang's latest patents is titled "Variable-structure stacked cable topology and packaging method therefor." This invention features a variable-structure stacked cable topology that includes multiple sections of stacked cables connected sequentially. Each section comprises a plurality of base tapes, with at least one being a superconducting tape. This design allows for a cable topological structure that can maintain a uniform critical current along its length.

Another notable patent is for an "IGBT and manufacturing method therefor." In this invention, a target region in the IGBT is doped with first ions, improving the breakdown voltage and shortening the turn-off time. The gradual junction formed enhances the anti-latch capability, making it a significant advancement in IGBT technology.

Career Highlights

Xueliang Wang has worked with notable organizations such as Huawei Technologies Co., Limited and Shanghai Jiao Tong University. His experience in these institutions has allowed him to develop and refine his innovative ideas, contributing to his success as an inventor.

Collaborations

Throughout his career, Xueliang Wang has collaborated with esteemed colleagues, including Jianhua Liu and Jinrong Lang. These partnerships have fostered a creative environment that has led to groundbreaking advancements in technology.

Conclusion

Xueliang Wang's contributions to cable topology and IGBT technology highlight his innovative spirit and dedication to advancing engineering solutions. His patents reflect a commitment to improving the efficiency and functionality of electrical systems.