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For the Inventor, By the Inventor

San Jose, CA, United States of America

Xue Chang

USPTO Granted Patents = 16 

Average Co-Inventor Count = 4.0

ph-index = 2

Forward Citations = 20(Granted Patents)


Company Filing History:

goldMedal16 out of 13,684 
 
Applied Materials, Inc.
 patents

Years Active: 2019-2025

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16 patents (USPTO):
1. 12341048 - Porous plug for electrostatic chuck gas delivery (2025-06-24),
2. D1066275 - Baffle for anti-rotation process kit for substrate processing chamber (2025-03-11),
3. 12211734 - Lift pin mechanism (2025-01-28),
4. 12198903 - Plasma resistant arc preventative coatings for manufacturing equipment components (2025-01-14),
5. 12183605 - In-situ semiconductor processing chamber temperature apparatus (2024-12-31),
6. D1049067 - Ring for an anti-rotation process kit for a substrate processing chamber (2024-10-29),
7. 12100576 - Metal oxide preclean chamber with improved selectivity and flow conductance (2024-09-24),
8. 12020977 - Lift pin assembly (2024-06-25),
9. 11835146 - Symmetric flow valve for flow conductance control (2023-12-05),
10. 11551965 - Apparatus to reduce polymers deposition (2023-01-10),
11. 11211282 - Apparatus to reduce contamination in a plasma etching chamber (2021-12-28),
12. 11199267 - Symmetric flow valve for higher flow conductance (2021-12-14),
13. 11069547 - In-situ temperature measurement for inside of process chamber (2021-07-20),
14. 10847351 - Plasma chamber with tandem processing regions (2020-11-24),
15. 10811233 - Process chamber having tunable showerhead and tunable liner (2020-10-20),

Title: Innovator Spotlight: Xue Yang Chang

Introduction: Xue Yang Chang is a distinguished inventor based in San Jose, California. With a prolific career at Applied Materials, Inc., she has made significant contributions to the field of substrate processing technology. Xue holds three patents, showcasing her innovative spirit and technical expertise.

Latest Patents: Among her latest patents, Xue has developed a "Baffle for Anti-Rotation Process Kit for Substrate Processing Chamber" and an innovative "Lift Pin Mechanism." The lift pin mechanism patent details methods and apparatus designed to enhance substrate processing chambers. This mechanism features a lift pin with a carefully crafted shaft, coupled with a sophisticated bellows assembly that enables precise axial movement and seals the central volume efficiently.

Career Highlights: Xue Yang Chang's career at Applied Materials, Inc. has been marked by her dedication to advancing substrate processing technologies. Her inventive works not only enhance operational efficiency but also address challenges in the industry, making her an invaluable asset to her team and the company.

Collaborations: During her career, Xue has worked closely with her coworker, Timothy Joseph Franklin. Their collaboration highlights the importance of teamwork in driving innovation within technology and engineering sectors.

Conclusion: Xue Yang Chang is a remarkable inventor whose work continues to shape the future of substrate processing technology. With her impressive patent portfolio and collaborative spirit, she is poised to make an even greater impact in the world of innovations.

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