This inventor holds 1 USPTO granted patent. Top assignee: Nanchang University. Active years: 2023.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2023
Title: Xu Tu: Innovator in Plasma Ion Measurement
Introduction
Xu Tu is a prominent inventor based in Nanchang, China. He has made significant contributions to the field of plasma physics, particularly in the measurement of ion nonextensive parameters. His innovative approach has opened new avenues for research and application in this specialized area.
Latest Patents
Xu Tu holds a patent titled "Method for measuring plasma ion nonextensive parameter." This invention relates to a method that describes plasma using nonextensive statistical mechanics. The process involves obtaining an equation that describes the relationship between the geodesic acoustic mode frequency and the ion acoustic speed of plasma. The method includes collecting measurement data of the geodesic acoustic mode frequencies and plasma temperature, which are then used to derive the ion nonextensive parameter numerically. This invention addresses a critical gap in diagnosing ion nonextensive parameters, complementing existing methods for measuring electron nonextensive parameters.
Career Highlights
Xu Tu is affiliated with Nanchang University, where he continues to advance research in plasma physics. His work has garnered attention for its innovative methodologies and practical applications in the field. With a focus on enhancing the understanding of plasma behavior, Xu Tu's contributions are vital for both academic and practical advancements.
Collaborations
Xu Tu has collaborated with notable colleagues, including Huibin Qiu and Zuozhi Hu. These partnerships have fostered a collaborative environment that encourages the exchange of ideas and expertise in plasma research.
Conclusion
Xu Tu's innovative work in measuring plasma ion nonextensive parameters represents a significant advancement in the field of plasma physics. His contributions not only enhance scientific understanding but also pave the way for future research and applications.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile