Xiuling Li

Title: The Innovations of Xiuling Li

Introduction

Xiuling Li is a notable inventor based in Tianshui, China. He has made significant contributions to the field of organic thin-film transistors, showcasing his expertise through innovative patents. His work has implications for various electronic applications, particularly in low-voltage operations.

Latest Patents

One of Xiuling Li's key patents is titled "Low-voltage operation dual-gate organic thin-film transistors and methods of manufacturing thereof." This patent describes a thin-film transistor (TFT) that includes a substrate, an organic semiconductor (OSC) layer positioned on the substrate, a dielectric layer on the OSC layer, and a polymeric interlayer between the OSC layer and the dielectric layer. The design allows the dielectric layer to exhibit a double layer capacitance effect. The method of forming this thin-film transistor involves providing a substrate, a bottom gate layer atop the substrate, and successively disposing an OSC layer, a dielectric layer, and a top gate layer, all while using a single mask for patterning.

Career Highlights

Throughout his career, Xiuling Li has worked with prominent organizations, including Corning Incorporated and the University-industry Cooperation Group of Kyung Hee University. His experience in these institutions has allowed him to collaborate with other experts in the field and further his research in organic electronics.

Collaborations

Xiuling Li has collaborated with notable colleagues such as Mingqian He and Jin Hee Jang. These partnerships have contributed to the advancement of his research and the development of innovative technologies.

Conclusion

Xiuling Li's contributions to the field of organic thin-film transistors highlight his innovative spirit and dedication to advancing technology. His patent and career achievements reflect his significant impact on the industry.