Xiucui Wang

Title: Xiucui Wang: Innovator in Critical Dimension Error Analysis

Introduction

Xiucui Wang is a prominent inventor based in Shanghai, China. He has made significant contributions to the field of lithography through his innovative methods. His work focuses on improving the accuracy of critical dimension measurements, which are essential in semiconductor manufacturing.

Latest Patents

Xiucui Wang holds a patent for a critical dimension error analysis method. This invention involves performing lithography processes on a wafer and measuring the critical dimension (CD) values of test points. The method includes removing extreme outliers from the CD values and rebuilding the remaining values using a reconstruction model fitting method. The rebuilt critical dimension values are then analyzed to modify machine parameters and masks, ensuring a more accurate lithography process.

Career Highlights

Xiucui Wang is associated with the Shanghai IC R&D Center Co., Ltd. His work at this company has been instrumental in advancing lithography techniques. He has demonstrated a commitment to enhancing the precision of semiconductor manufacturing processes.

Collaborations

Xiucui Wang has collaborated with notable colleagues, including Xueru Yu and Hongxia Sun. Their teamwork has contributed to the development of innovative solutions in the field of semiconductor research.

Conclusion

Xiucui Wang's contributions to critical dimension error analysis represent a significant advancement in lithography technology. His innovative methods are poised to enhance the accuracy and efficiency of semiconductor manufacturing processes.