Xiongwu He

Title: Xiongwu He: Innovator in Contact Structure Manufacturing

Introduction

Xiongwu He is a notable inventor based in Fujian, China. He has made significant contributions to the field of manufacturing methods, particularly in the development of contact structures. His innovative approach has led to the filing of a patent that showcases his expertise and creativity.

Latest Patents

Xiongwu He holds a patent for a manufacturing method of a contact structure. This method includes several steps, starting with the provision of a substrate that consists of a first region and a second region. A dielectric layer is formed on the substrate, followed by the creation of a photoresist layer on top of the dielectric layer. An exposure process is then performed, which includes both first and second exposure steps. Each of the first exposure steps targets a part of the first region, while the second exposure steps focus on the second region, incorporating a first overlay shift by a predetermined distance. Finally, a develop process is executed to form openings in the photoresist layer. This patent highlights his innovative approach to manufacturing techniques.

Career Highlights

Xiongwu He is currently associated with United Semiconductor (Xiamen) Co., Ltd., where he applies his skills and knowledge in semiconductor manufacturing. His work has been instrumental in advancing the technology used in contact structures, which are critical components in various electronic devices.

Collaborations

Xiongwu He has collaborated with notable colleagues such as Weiguo Xu and Yuan-Chi Pai. These partnerships have fostered a creative environment that encourages innovation and the sharing of ideas.

Conclusion

Xiongwu He is a prominent inventor whose work in the manufacturing method of contact structures has made a significant impact in the semiconductor industry. His contributions continue to influence advancements in technology and manufacturing processes.