Hefei, China

Xinru Han

This inventor holds 2 USPTO granted patents and 4 published patent applications and 1 EPO patent. Top assignee: Changxin Memory Technologies, Inc.. Active years: 2024-2025.

USPTO Granted Patents = 2 

% Patents Active = 100.0

 

Average Co-Inventor Count = 3.4

ph-index = 1


Company Filing History:


Years Active: 2024-2025

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2 patents (USPTO):Explore Patents

Title: Innovations of Inventor Xinru Han

Introduction

Xinru Han is a notable inventor based in Hefei, China. He has made significant contributions to the field of semiconductor technology. With a total of 2 patents to his name, his work focuses on advanced manufacturing methods and structures in the semiconductor industry.

Latest Patents

Xinru Han's latest patents include a semiconductor structure and a manufacturing method thereof. The first patent provides a detailed manufacturing method that involves providing a substrate and forming a sacrificial dielectric layer on it. The process includes patterning the sacrificial dielectric layer to create first and second trenches, followed by the formation of protective layers and bit line structures. His second patent outlines a method for manufacturing a contact hole, which includes forming a mask layer, exposing patterns, and depositing insulation layers to create a semiconductor structure and electronic equipment.

Career Highlights

Xinru Han is currently employed at Changxin Memory Technologies, Inc. His work at this company has positioned him as a key player in the semiconductor industry. His innovative approaches have contributed to advancements in semiconductor manufacturing techniques.

Collaborations

Xinru collaborates with talented coworkers, including Yang Chen and Shiran Zhang. Their combined expertise fosters a creative environment that drives innovation in their projects.

Conclusion

Xinru Han's contributions to semiconductor technology through his patents and work at Changxin Memory Technologies, Inc. highlight his role as an influential inventor in the field. His innovative methods continue to shape the future of semiconductor manufacturing.

Profile summary based on public USPTO records.
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