Xingyi Chen

Title: Innovations of Xingyi Chen in Lens Distortion Measurement

Introduction

Xingyi Chen is an accomplished inventor based in Qingdao, China. He has made significant contributions to the field of lens distortion measurement, holding two patents that enhance the accuracy and efficiency of this process. His work is particularly relevant in industries that rely on precise optical measurements.

Latest Patents

Xingyi Chen's latest patents focus on a method and system for measuring lens distortion. The method involves providing a test card with a dot matrix pattern of K×N dots, where K and N are both positive integers. The process includes obtaining a distorted image of the test card after it has been distorted by a lens. A planar coordinate system is established for the distorted image, using a dot at the upper left corner as the coordinate origin. The method positions a center dot and all non-center dots by scanning and searching, determining their coordinate values in the planar coordinate system. Finally, it calculates the distortion amount of the distorted image using these coordinate values, thereby improving the accuracy of lens distortion measurement and accelerating image processing speed.

Career Highlights

Xingyi Chen is associated with Qingdao Goertek Technology Co., Ltd., where he applies his expertise in optical technologies. His innovative approaches have contributed to advancements in the field, making him a notable figure in lens measurement technologies.

Collaborations

Xingyi Chen has worked alongside talented colleagues, including Jianjun Xu and Xiliang Niu. Their collaborative efforts have furthered the development of effective solutions in lens distortion measurement.

Conclusion

Xingyi Chen's contributions to lens distortion measurement through his innovative patents demonstrate his commitment to advancing optical technology. His work not only enhances measurement accuracy but also accelerates processing speeds, making a significant impact in the field.