Xing Wu

Title: Innovations of Xing Wu in Image Simulation and Defect Detection

Introduction

Xing Wu is a notable inventor based in Nanjing, China. He has made significant contributions to the field of image simulation and defect detection, particularly in the context of patterned wafers. His innovative approach addresses challenges in generating simulated images and datasets for defect inspection.

Latest Patents

Xing Wu holds a patent titled "Methods for image simulation, pseudo-random defect dataset generation, and micro and nano defects detection." This patent outlines a method for generating simulated images based on near-field simulations of computational electromagnetic fields. The process involves constructing a three-dimensional model and a simulated Kohler illumination model, which are essential for achieving accurate optical simulations. The method also emphasizes the importance of balancing simulation cost and accuracy through a criterion based on the degree of similarity in synthesized images.

Career Highlights

Xing Wu has worked at prominent institutions, including Nanjing University of Aeronautics and Astronautics and the Suzhou Research Institute of Nanjing University of Aeronautics and Astronautics. His experience in these organizations has allowed him to develop and refine his innovative techniques in image simulation and defect detection.

Collaborations

Xing Wu has collaborated with notable colleagues such as Kai Meng and Junquan Zhou. Their combined expertise has contributed to advancements in their respective fields.

Conclusion

Xing Wu's work in image simulation and defect detection represents a significant advancement in technology. His innovative methods and collaborations continue to influence the field, paving the way for future developments.