This inventor holds 1 USPTO granted patent. Top assignee: Asml Netherlands B.v.. Active years: 2025.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2025
Title: The Innovations of Xing Lan Liu
Introduction
Xing Lan Liu is a notable inventor based in Ukkel, Belgium. He has made significant contributions to the field of computational metrology, particularly in the context of device manufacturing processes. His innovative approach has led to the development of a unique method that enhances the accuracy and efficiency of manufacturing.
Latest Patents
Xing Lan Liu holds 1 patent related to computational metrology. This patent involves a method that determines a first distribution of a first parameter associated with an error or residual in performing a device manufacturing process. It also includes determining a second distribution of a second parameter associated with an error or residual in the same process. Furthermore, the method establishes a distribution of a parameter of interest associated with the device manufacturing process using a function that operates on the first and second distributions, which may include a correlation.
Career Highlights
Xing Lan Liu is currently employed at ASML Netherlands B.V., a leading company in the semiconductor industry. His work at ASML focuses on advancing technologies that are crucial for the manufacturing of integrated circuits. His expertise in computational metrology has positioned him as a valuable asset to the company.
Collaborations
Some of his notable coworkers include Wim Tjibbo Tel and Bart Peter Bert Segers. Their collaboration contributes to the innovative environment at ASML, fostering advancements in technology and manufacturing processes.
Conclusion
Xing Lan Liu's contributions to computational metrology exemplify the impact of innovation in the manufacturing sector. His work not only enhances device manufacturing processes but also showcases the importance of collaboration in driving technological advancements.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
