This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Honor Device Co., Ltd.. Active years: 2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2026
Title: Innovations of Inventor Xin Bai
Introduction: Xin Bai is a notable inventor based in Shenzhen, China. He has made significant contributions to the field of image prediction technology. His innovative approach has led to the development of a unique patent that enhances electronic devices.
Latest Patents: Xin Bai holds a patent for an "Image prediction method, electronic device, and storage medium." This application provides a comprehensive image prediction method that includes obtaining a drawing instruction stream of a first image frame. The first image frame contains one or more first objects. The method involves calculating a first motion vector between the first objects and third objects that match them. Additionally, it includes obtaining a second motion vector and calculating a third motion vector based on the first and second motion vectors. Ultimately, the method allows for obtaining a first prediction image frame based on these vectors and the first objects.
Career Highlights: Xin Bai has made a mark in the technology sector through his work at Honor Device Co., Ltd. His expertise in image processing and prediction methods has positioned him as a valuable asset in the company. With a focus on innovation, he continues to push the boundaries of technology.
Collaborations: Xin Bai collaborates with talented individuals in his field, including Yuchen Wang and Zhaoyang Yin. Their combined efforts contribute to the advancement of technology and innovation within their projects.
Conclusion: Xin Bai's contributions to image prediction technology exemplify the spirit of innovation. His patent and work at Honor Device Co., Ltd. highlight his commitment to advancing electronic devices. The impact of his inventions is likely to influence the industry for years to come.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile