Xiliang Niu

Title: Xiliang Niu: Innovator in Lens Distortion Measurement

Introduction

Xiliang Niu is a notable inventor based in Qingdao, China. He has made significant contributions to the field of lens distortion measurement, holding three patents to his name. His work focuses on improving the accuracy and efficiency of measuring lens distortion, which is crucial in various optical applications.

Latest Patents

Xiliang Niu's latest patents include a method and system for measuring lens distortion. This innovative method involves providing a test card with a dot matrix pattern, obtaining a distorted image of the test card, and establishing a planar coordinate system for the distorted image. The process includes positioning a center dot and non-center dots, determining their coordinate values, and calculating the distortion amount using a specific equation. This method not only accelerates image processing speed but also enhances the accuracy of lens distortion measurements.

Career Highlights

Xiliang Niu is currently associated with Qingdao Goertek Technology Co., Ltd. His work at this company has allowed him to develop and refine his innovative methods for lens distortion measurement. His contributions have been instrumental in advancing the technology used in optical systems.

Collaborations

Xiliang Niu has collaborated with notable colleagues, including Xingyi Chen and Jianjun Xu. Their teamwork has fostered an environment of innovation and has led to the successful development of new technologies in their field.

Conclusion

Xiliang Niu's work in lens distortion measurement exemplifies the impact of innovation in optical technology. His patents and collaborations highlight his commitment to advancing this important area of research.