Xiamen, China

Xichong Zhang

This inventor holds 3 USPTO granted patents and 3 published patent applications and 1 EPO patent. Top assignee: Hithium Tech Hk Limited. Active years: 2025-2026.

USPTO Granted Patents = 3 

% Patents Active = 100.0

 

Average Co-Inventor Count = 4.9

ph-index = 1


Company Filing History:


Years Active: 2025-2026

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3 patents (USPTO):Explore Patents

Title: Xichong Zhang: Innovator in Film Plating Technology

Introduction

Xichong Zhang is a notable inventor based in Xiamen, China. He has made significant contributions to the field of film plating technology. His innovative approach has led to the development of a unique anode plate that enhances the efficiency of film plating machines.

Latest Patents

Xichong Zhang holds a patent for an "Anode plate for film plating machine and film plating machine." This invention features an anode plate formed by splicing multiple anode plate splicing units, with insulating mediums separating adjacent units. Each splicing unit is connected to a power supply, making the anode plate applicable to film plating machines of varying breadth. He has 1 patent to his name.

Career Highlights

Zhang is currently employed at Hithium Tech HK Limited, where he continues to innovate in the field of film plating technology. His work has garnered attention for its practical applications and efficiency improvements in manufacturing processes.

Collaborations

Xichong Zhang collaborates with Qian Zhao, who is also involved in the development of advanced technologies at Hithium Tech HK Limited.

Conclusion

Xichong Zhang's contributions to film plating technology demonstrate his commitment to innovation and efficiency. His patent for the anode plate showcases his ability to address industry needs effectively.

Profile summary based on public USPTO records.
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