The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 07, 2026
Filed:
Jun. 29, 2022
Applicant:
Hithium Tech HK Limited, Kowloon, HK;
Inventors:
Xichong Zhang, Xiamen, CN;
Yuyuan Wu, Xiamen, CN;
Qian Zhao, Xiamen, CN;
Qin Zhang, Xiamen, CN;
Jinhua Lan, Xiamen, CN;
Assignee:
HITHIUM TECH HK LIMITED, Kowloon, HK;
Primary Examiner:
Int. Cl.
CPC ...
C25D 17/12 (2006.01); C25D 17/28 (2006.01); H01M 4/04 (2006.01); H01M 10/0525 (2010.01);
U.S. Cl.
CPC ...
C25D 17/12 (2013.01); C25D 17/28 (2013.01); H01M 4/0452 (2013.01); H01M 10/0525 (2013.01);
Abstract
An anode plate for a film plating machine and a film plating machine are provided. The anode plate is formed by splicing a plurality of anode plate splicing units, and two adjacent anode plate splicing units are separated by an insulating medium. Each anode plate splicing unit is connected with a power supply. The anode plate is applicable to film plating machines of different breadth.