Fremont, CA, United States of America

Xiaoxia Huang

This inventor holds 1 USPTO granted patent. Top assignee: Asml Netherlands B.v.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Xiaoxia Huang. Retrieved from https://idiyas.com/inventor/xiaoxia-huang-9qpg0eko

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Xiaoxia Huang and Anomaly-Based Defect Inspection

Introduction

Xiaoxia Huang is an inventor based in Fremont, California, whose patent work addresses methods for identifying potential defects in samples. The supplied information lists him as working at ASML Netherlands B.V.

Latest Patents

The supplied data lists one patent for Huang: “Method and System for Anomaly-Based Defect Inspection.” The invention describes a system that receives two associated images of a sample and uses clustering techniques to determine feature descriptors for corresponding pixels. It then calculates mapping probabilities between descriptors and provides an output indicating whether a pixel may represent a candidate defect when a probability falls below a threshold. This approach is intended to support anomaly-based inspection.

Career Highlights

Huang’s listed patent reflects work on image analysis and defect detection. The supplied information identifies ASML Netherlands B.V. as his company and records 1 patent.

Collaborations

The supplied information names Yani Chen as Huang’s coworker. It does not specify her role in the patent or describe a direct collaboration.

Conclusion

Xiaoxia Huang’s listed invention applies image-based feature analysis and probability mapping to help identify candidate defects, highlighting a focused contribution to inspection technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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