Xiaowei Li

Title: Innovations of Xiaowei Li in Wafer Metrology

Introduction

Xiaowei Li is a notable inventor based in Milpitas, CA (US). He has made significant contributions to the field of wafer metrology, particularly through his innovative patent. His work focuses on enhancing the accuracy and efficiency of measuring wafer surfaces, which is crucial in semiconductor manufacturing.

Latest Patents

Xiaowei Li holds a patent titled "Method and system for regional phase unwrapping with pattern-assisted correction." This patent describes a wafer metrology system that includes an interferometer sub-system and a controller. The interferometer sub-system is designed to generate an interferogram with an intensity map that corresponds to a modulated representation of a wafer surface. The system captures the interferogram using a detector and employs processors to generate a wrapped phase map. It defines patterns associated with features on the wafer and corrects phase discontinuities through a phase unwrapping procedure. This innovative approach allows for the generation of an unwrapped phase map while ensuring continuity across borders separating structures of the same type.

Career Highlights

Xiaowei Li is currently employed at KLA Tencor Corporation, a leading company in the field of semiconductor process control and yield management. His work at KLA Tencor has positioned him as a key player in advancing wafer metrology technologies. With a focus on precision and innovation, he continues to contribute to the development of cutting-edge solutions in the semiconductor industry.

Collaborations

Xiaowei Li collaborates with talented professionals such as Xuan Zhao and Helen Heng Liu. Their combined expertise fosters an environment of innovation and creativity, leading to advancements in wafer metrology and related technologies.

Conclusion

Xiaowei Li's contributions to wafer metrology through his innovative patent demonstrate his commitment to advancing technology in the semiconductor industry. His work not only enhances measurement accuracy but also plays a vital role in the efficiency of semiconductor manufacturing processes.