Xiaorong Shi

Title: Innovations by Xiaorong Shi

Introduction

Xiaorong Shi is a prominent inventor based in San Jose, CA, known for her contributions to the field of semiconductor technology. With a total of 5 patents to her name, she has made significant advancements in the design and fabrication of trench-gated MIS devices.

Latest Patents

One of her latest patents focuses on trench-gated MIS devices. In this innovation, contact is made to the gate within the trench, eliminating the need for the gate material, typically polysilicon, to extend outside of the trench. This design addresses the issue of stress at the upper corners of the trench. The contact between the gate metal and the polysilicon is typically made in a gate metal region outside the active region of the device. Various configurations for establishing this contact are described, including embodiments where the trench is widened in the area of contact. Since the polysilicon is etched back below the top surface of the silicon throughout the device, there is usually no need for a polysilicon mask, which helps save on fabrication costs.

Career Highlights

Xiaorong Shi has worked with notable companies in the semiconductor industry, including Vishay Siliconix and Siliconix Incorporated. Her experience in these organizations has contributed to her expertise in developing innovative semiconductor solutions.

Collaborations

Xiaorong has collaborated with several professionals in her field, including Anup Bhalla and Jacek Korec. These collaborations have further enhanced her work and contributions to semiconductor technology.

Conclusion

Xiaorong Shi's innovative work in trench-gated MIS devices showcases her significant impact on the semiconductor industry. Her patents reflect her commitment to advancing technology and improving fabrication processes.