Company Filing History:
Years Active: 2002-2012
Title: Innovations of Xiaorong Morrow in Integrated Circuit Technology
Introduction
Xiaorong Morrow is a prominent inventor based in Portland, OR (US), known for her significant contributions to the field of integrated circuit technology. With a total of 8 patents to her name, she has developed innovative methods that enhance the performance and reliability of electronic components.
Latest Patents
One of her latest patents is titled "Method and apparatus for forming metal-metal oxide etch stop/barrier for integrated circuit interconnects." This invention describes a method and apparatus for creating interconnects that feature a metal-metal oxide electromigration barrier and etch-stop. The process involves depositing a metal layer on a planarized interconnect layer, which includes an interlayer dielectric (ILD) that is level with the top of an electrically conductive interconnect. The method also includes reacting the metal layer with the ILD to form a protective metal oxide layer. This innovative approach ensures that the metal layer is not significantly oxidized by the conductive interconnect, thereby improving electromigration performance. The combination of the metal barrier and metal oxide layer serves as a protective layer, with the potential for a second ILD to be formed on top, acting as an etch-stop during subsequent etching processes.
Career Highlights
Xiaorong Morrow has worked with leading technology companies, including Intel Corporation, where she has honed her skills and contributed to groundbreaking advancements in semiconductor technology. Her work has been instrumental in pushing the boundaries of what is possible in integrated circuit design and manufacturing.
Collaborations
Throughout her career, Xiaorong has collaborated with notable colleagues, including Jihperng Leu and Markus Kuhn. These partnerships have fostered an environment of innovation and creativity, leading to the development of cutting-edge technologies.
Conclusion
Xiaorong Morrow's contributions to integrated circuit technology through her patents and collaborations highlight her role as a key innovator in the field. Her work continues to influence the future of electronics and semiconductor manufacturing.