Xiaolan Zhong

Title: Xiaolan Zhong: Innovator in Semiconductor Technology

Introduction

Xiaolan Zhong is a prominent inventor based in Shanghai, China. He has made significant contributions to the field of semiconductor technology, holding a total of 2 patents. His innovative approaches have the potential to enhance product performance and reduce costs in various applications.

Latest Patents

Xiaolan Zhong's latest patents include a method for forming an intermetallic air gap. This invention discloses a process that involves several steps, including forming a trench in a solid dielectric and preparing an insulating sheet-like two-dimensional material. The method effectively increases the intermetallic air gap formation ratio, reduces the effective dielectric constant, and minimizes interconnection delay. Another notable patent is an apparatus and method for improving film thickness uniformity. This invention utilizes a PECVD machine with twin chambers and a rotating wafer heating platform to ensure even film distribution across the wafer, thereby eliminating abrupt changes in film thickness.

Career Highlights

Throughout his career, Xiaolan Zhong has worked with notable companies such as Shanghai IC R&D Center Co., Ltd and Shanghai Integrated Circuit Equipment & Materials Industry Innovation Center Co., Ltd. His work in these organizations has allowed him to develop and refine his innovative techniques in semiconductor manufacturing.

Collaborations

Xiaolan Zhong has collaborated with talented individuals in his field, including Xiaoxu Kang and Ruoxi Shen. These collaborations have contributed to the advancement of technology and innovation in semiconductor applications.

Conclusion

Xiaolan Zhong's contributions to semiconductor technology through his patents and career achievements highlight his role as an influential inventor. His innovative methods and collaborative efforts continue to shape the future of the industry.