Xiaolan Zhang

Title: Innovations of Xiaolan Zhang in Photovoltaic Technology

Introduction

Xiaolan Zhang is a prominent inventor based in Niskayuna, NY (US). She has made significant contributions to the field of semiconductor technology, particularly in photovoltaic devices. With a total of 2 patents, her work focuses on enhancing the efficiency and functionality of solar energy systems.

Latest Patents

Xiaolan Zhang's latest patents include innovative designs for compositionally-graded and structurally-graded photovoltaic devices. These patents describe a semiconductor structure that consists of a semiconductor substrate and a semiconductor layer. The semiconductor layer is both compositionally graded and structurally graded, which allows for improved performance. Specifically, the layer transitions from substantially intrinsic at the interface with the substrate to substantially doped at the opposite surface. Additionally, the layer is structurally graded from substantially crystalline at the interface to substantially amorphous at the opposite surface. These advancements are crucial for the development of more efficient solar cells.

Career Highlights

Xiaolan Zhang is currently employed at General Electric Company, where she continues to push the boundaries of photovoltaic technology. Her work has garnered attention for its innovative approach to semiconductor structures, which are essential for the next generation of solar energy solutions.

Collaborations

Xiaolan has collaborated with notable colleagues such as Bastiaan Arie Korevaar and James Neil Johnson. These partnerships have contributed to the advancement of her research and the successful development of her patented technologies.

Conclusion

Xiaolan Zhang's contributions to photovoltaic technology exemplify her dedication to innovation in the field of semiconductors. Her patents reflect a commitment to enhancing solar energy efficiency, making her a key figure in the industry.