Company Filing History:
2 out of 934 
2 out of 1,724 
Years Active: 2015-2023
Title: Xiaohui Zhuang: Innovator in Semiconductor Technology
Introduction
Xiaohui Zhuang is a prominent inventor based in Shanghai, China. He has made significant contributions to the field of semiconductor technology, holding 2 patents that showcase his innovative approaches to device fabrication.
Latest Patents
Zhuang's latest patents include a method for forming a metal plug through a hole in a device that incorporates a resistance layer and contacts embedded conductive structures. This patent outlines a process that involves providing a substrate with distinct regions, forming device layers, and utilizing selective metal growth to create plugs in the substrate. Another notable patent focuses on the fabrication of fin field-effect transistors. This method details the creation of fin structures on a substrate, the use of mask layers, and the etching process to form fins, along with the integration of gate structures and source/drain regions.
Career Highlights
Throughout his career, Xiaohui Zhuang has worked with leading companies in the semiconductor industry, including Semiconductor Manufacturing International Corporation in both Beijing and Shanghai. His experience in these organizations has allowed him to refine his skills and contribute to cutting-edge technologies in semiconductor fabrication.
Collaborations
Zhuang has collaborated with notable colleagues in his field, including Yunchu Yu and Yihua Shen. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.
Conclusion
Xiaohui Zhuang's work in semiconductor technology exemplifies the spirit of innovation. His patents and career achievements reflect his dedication to advancing the field and contributing to the development of new technologies.