Xiaohong Cheng

Title: Innovations of Xiaohong Cheng in Semiconductor Technology

Introduction

Xiaohong Cheng is a prominent inventor based in Beijing, China. He has made significant contributions to the field of semiconductor technology, holding a total of 3 patents. His work focuses on developing advanced semiconductor devices that enhance performance and efficiency.

Latest Patents

Cheng's latest patents include a semiconductor device having high driving capability and steep subthreshold swing (SS) characteristic and a method of manufacturing the same. This invention discloses a semiconductor device that comprises a substrate and a channel portion. The channel portion features a fin-shaped structure and nanowires or nanosheets that are strategically arranged to optimize performance.

Another notable patent is the stacked nanowire or nanosheet gate-all-around device and method for manufacturing the same. This device includes a silicon substrate with stacked nanowires or nanosheets, surrounded by a gate stack. The design incorporates a notch structure that isolates the stacked components from the substrate, enhancing the device's functionality.

Career Highlights

Xiaohong Cheng is affiliated with the Chinese Academy of Sciences, where he conducts research and development in semiconductor technologies. His innovative work has positioned him as a key figure in advancing semiconductor device design and manufacturing processes.

Collaborations

Cheng collaborates with esteemed colleagues, including Yongliang Li and Wenwu Wang, who contribute to his research endeavors. Their combined expertise fosters a collaborative environment that drives innovation in semiconductor technology.

Conclusion

Xiaohong Cheng's contributions to semiconductor technology through his patents and research at the Chinese Academy of Sciences highlight his role as a leading inventor in the field. His work continues to influence advancements in semiconductor devices, paving the way for future innovations.