Clifton Park, NY, United States of America

Xiaohan Wang

This inventor holds 2 USPTO granted patents. Top assignee: Globalfoundries Inc.. Active years: 2019.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Xiaohan Wang. Retrieved from https://idiyas.com/inventor/xiaohan-wang-nupu3a1h

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 7(Granted Patents)


Company Filing History:


Years Active: 2019

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2 patents (USPTO):Explore Patents

Title: Innovations of Xiaohan Wang in Self-Aligned Multiple Patterning Processes

Introduction

Xiaohan Wang is an accomplished inventor based in Clifton Park, NY (US). He has made significant contributions to the field of semiconductor manufacturing, particularly in self-aligned multiple patterning processes. With a total of 2 patents, his work has advanced the techniques used in creating intricate patterns on semiconductor wafers.

Latest Patents

Wang's latest patents include innovative methods for self-aligned multiple patterning. The first patent describes processes involving layered mandrels, where a mandrel line is patterned from a first mandrel layer disposed on a hardmask and a second mandrel layer over the first. This method allows for the removal of specific sections to expose portions of the hardmask, ultimately forming a trench through an etching process. The second patent focuses on self-aligned double patterning, utilizing bi-layer mandrels and block masks to improve interconnect structures. This involves forming a mandrel line over a hardmask and strategically removing layers to create precise trenches.

Career Highlights

Xiaohan Wang is currently employed at GlobalFoundries Inc., a leading semiconductor manufacturer. His expertise in self-aligned multiple patterning processes has positioned him as a key player in the development of advanced semiconductor technologies. His innovative approaches have not only enhanced manufacturing efficiency but also contributed to the overall advancement of the industry.

Collaborations

Wang has collaborated with notable colleagues, including Jiehui Shu and Jinping Liu. These partnerships have fostered a collaborative environment that encourages the exchange of ideas and the development of cutting-edge technologies.

Conclusion

Xiaohan Wang's contributions to the field of semiconductor manufacturing through his patents and collaborative efforts highlight his role as an influential inventor. His work continues to shape the future of semiconductor technology, making significant strides in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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