Hefei, China

Xiaofang Zhou

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Changxin Memory Technologies, Inc.. Active years: 2023.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Xiaofang Zhou. Retrieved from https://idiyas.com/inventor/xiaofang-zhou-qhtvs384

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1


Company Filing History:


Years Active: 2023

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1 patent (USPTO):Explore Patents

Title: Innovations of Xiaofang Zhou in Overlay Accuracy Control

Introduction

Xiaofang Zhou is a notable inventor based in Hefei, China. He has made significant contributions to the field of semiconductor technology, particularly in overlay accuracy control methods. His innovative approach has the potential to enhance the precision of photoetching processes in wafer production.

Latest Patents

Xiaofang Zhou holds a patent for a "Control method and device of overlay accuracy." This patent outlines a method for determining whether a similar layer exists in relation to a present layer, both aligned to a common reference layer. The method includes calculating an overlay error compensation value based on previous batches, which is crucial for improving the accuracy of the photoetching process.

Career Highlights

Xiaofang Zhou is currently employed at Changxin Memory Technologies, Inc., where he applies his expertise in semiconductor manufacturing. His work focuses on enhancing the efficiency and accuracy of production processes, contributing to the advancement of memory technology.

Collaborations

Xiaofang collaborates with various professionals in his field, including his coworker, Xing Zhang, who is also involved in innovative projects related to semiconductor technology.

Conclusion

Xiaofang Zhou's contributions to overlay accuracy control represent a significant advancement in semiconductor technology. His innovative methods and dedication to precision continue to influence the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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